Catalytic Chemical Vapor Deposition : (Record no. 68998)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 04791cam a2200637Ii 4500 |
| 001 - CONTROL NUMBER | |
| control field | on1085348592 |
| 005 - DATE AND TIME OF LATEST TRANSACTION | |
| control field | 20220711203454.0 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 190211s2019 gw ob 001 0 eng d |
| 019 ## - | |
| -- | 1085592940 |
| -- | 1104299158 |
| -- | 1104392774 |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 9783527818662 |
| -- | (electronic bk.) |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 3527818669 |
| -- | (electronic bk.) |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 9783527818655 |
| -- | (electronic bk. ; |
| -- | oBook) |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 3527818650 |
| -- | (electronic bk. ; |
| -- | oBook) |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 352734523X |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 9783527345236 |
| 029 1# - (OCLC) | |
| OCLC library identifier | AU@ |
| System control number | 000065193783 |
| 029 1# - (OCLC) | |
| OCLC library identifier | CHNEW |
| System control number | 001039346 |
| 029 1# - (OCLC) | |
| OCLC library identifier | CHVBK |
| System control number | 559028091 |
| 029 1# - (OCLC) | |
| OCLC library identifier | UKMGB |
| System control number | 019253713 |
| 037 ## - | |
| -- | 9783527818662 |
| -- | Wiley |
| 082 04 - CLASSIFICATION NUMBER | |
| Call Number | 660.2995 |
| 100 1# - AUTHOR NAME | |
| Author | Matsumura, H. |
| 245 10 - TITLE STATEMENT | |
| Title | Catalytic Chemical Vapor Deposition : |
| Sub Title | Technology and Applications of Cat-CVD / |
| 300 ## - PHYSICAL DESCRIPTION | |
| Number of Pages | 1 online resource |
| 505 0# - FORMATTED CONTENTS NOTE | |
| Remark 2 | Fundamentals for Studying the Physics of Cat-CVD and Difference from PECVD -- Fundamentals for Analytical Methods for Revealing Chemical Reactions in Cat-CVD -- Physics and Chemistry of Cat-CVD -- Properties of Inorganic Films Prepared by Cat-CVD -- Organic Polymer Synthesis by Cat-CVD-Related Technology -- Initiated CVD (iCVD) -- Physics and Technologies for Operating Cat-CVD Apparatus -- Application of Cat-CVD Technologies -- Radicals Generated in Cat-CVD Apparatus and Their Application -- Cat-doping: A Novel Low-Temperature Impurity Doping Technology. |
| 520 ## - SUMMARY, ETC. | |
| Summary, etc | The authoritative reference on catalytic chemical vapor deposition'written by the inventor of the technology This comprehensive book covers a wide scope of Cat-CVD and related technologies'from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field'including the father of catalytic chemical vapor deposition'it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications.-Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD) -Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles -Presents comparisons of different Cat-CVD methods which are usually not found in research papers -Bridges academic and industrial research'showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies. |
| 650 #7 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| General subdivision | Chemistry |
| -- | Industrial & Technical. |
| 650 #7 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| General subdivision | Chemical & Biochemical. |
| 856 40 - ELECTRONIC LOCATION AND ACCESS | |
| Uniform Resource Identifier | https://doi.org/10.1002/9783527818655 |
| 942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
| Koha item type | eBooks |
| 264 #1 - | |
| -- | Weinheim, Germany : |
| -- | Wiley-VCH, |
| -- | [2019] |
| 336 ## - | |
| -- | text |
| -- | txt |
| -- | rdacontent |
| 337 ## - | |
| -- | computer |
| -- | c |
| -- | rdamedia |
| 338 ## - | |
| -- | online resource |
| -- | cr |
| -- | rdacarrier |
| 588 0# - | |
| -- | Online resource; title from PDF title page (EBSCO, viewed February 13, 2019). |
| 650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| -- | Catalysts. |
| 650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| -- | Chemical vapor deposition. |
| 650 #7 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| -- | SCIENCE |
| 650 #7 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| -- | TECHNOLOGY & ENGINEERING |
| 650 #7 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| -- | Catalysts. |
| -- | (OCoLC)fst00848875 |
| 650 #7 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| -- | Chemical vapor deposition. |
| -- | (OCoLC)fst00853229 |
| 994 ## - | |
| -- | C0 |
| -- | DG1 |
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