Stress and strain engineering at nanoscale in semiconductor devices / (Record no. 71315)

000 -LEADER
fixed length control field 03399cam a2200553Ki 4500
001 - CONTROL NUMBER
control field 9781003055723
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20220711212444.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 210515s2021 flua ob 0|1 0 eng d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 9781000404937
-- electronic book
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 1000404935
-- electronic book
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 9781003055723
-- electronic book
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 1003055729
-- electronic book
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 9781000404951
-- electronic book
-- EPUB
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 1000404951
-- electronic book
-- EPUB
082 04 - CLASSIFICATION NUMBER
Call Number 620.1/123
100 1# - AUTHOR NAME
Author Maiti, C. K.,
245 10 - TITLE STATEMENT
Title Stress and strain engineering at nanoscale in semiconductor devices /
300 ## - PHYSICAL DESCRIPTION
Number of Pages 1 online resource
520 ## - SUMMARY, ETC.
Summary, etc Anticipating a limit to the continuous miniaturization (More-Moore), intense research efforts are being made to co-integrate various functionalities (More-than-Moore) in a single chip. Currently, strain engineering is the main technique used to enhance the performance of advanced semiconductor devices. Written from an engineering applications standpoint, this book encompasses broad areas of semiconductor devices involving the design, simulation, and analysis of Si, heterostructure silicongermanium (SiGe), and III-N compound semiconductor devices. The book provides the background and physical insight needed to understand the new and future developments in the technology CAD (TCAD) design at the nanoscale. Features Covers stressstrain engineering in semiconductor devices, such as FinFETs and III-V Nitride-based devices Includes comprehensive mobility model for strained substrates in global and local strain techniques and their implementation in device simulations Explains the development of strain/stress relationships and their effects on the band structures of strained substrates Uses design of experiments to find the optimum process conditions Illustrates the use of TCAD for modeling strain-engineered FinFETs for DC and AC performance predictions This book is for graduate students and researchers studying solid-state devices and materials, microelectronics, systems and controls, power electronics, nanomaterials, and electronic materials and devices.
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier https://www.taylorfrancis.com/books/9781003055723
856 42 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier http://www.oclc.org/content/dam/oclc/forms/terms/vbrl-201703.pdf
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type eBooks
264 #1 -
-- Boca Raton, FL :
-- CRC PRESS,
-- 2021.
336 ## -
-- text
-- txt
-- rdacontent
337 ## -
-- computer
-- c
-- rdamedia
338 ## -
-- online resource
-- cr
-- rdacarrier
588 ## -
-- OCLC-licensed vendor bibliographic record.
650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Strains and stresses.
650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Semiconductors.
650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Nanoelectronics.
650 #7 - SUBJECT ADDED ENTRY--SUBJECT 1
-- SCIENCE / Physics
650 #7 - SUBJECT ADDED ENTRY--SUBJECT 1
-- TECHNOLOGY / Electricity
650 #7 - SUBJECT ADDED ENTRY--SUBJECT 1
-- TECHNOLOGY / Electronics / Circuits / General

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