High-k gate dielectric materials : (Record no. 72062)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 05003cam a22006018i 4500 |
| 001 - CONTROL NUMBER | |
| control field | 9780429325779 |
| 005 - DATE AND TIME OF LATEST TRANSACTION | |
| control field | 20220711212736.0 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 200401s2020 onc ob 001 0 eng |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 0429325770 |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 9780429325779 |
| -- | (electronic bk.) |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 9781771888431 |
| -- | (electronic bk.) |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 1771888431 |
| -- | (electronic bk.) |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 9781000517767 |
| -- | (electronic bk. : PDF) |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 1000517764 |
| -- | (electronic bk. : PDF) |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 9781000522600 |
| -- | (electronic bk. : Mobipocket) |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 1000522601 |
| -- | (electronic bk. : Mobipocket) |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 9781000527445 |
| -- | (electronic bk. : EPUB) |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 1000527441 |
| -- | (electronic bk. : EPUB) |
| 082 0# - CLASSIFICATION NUMBER | |
| Call Number | 621.3815/2 |
| 245 00 - TITLE STATEMENT | |
| Title | High-k gate dielectric materials : |
| Sub Title | applications with advanced metal oxide semiconductor field effect transistors (MOSFETs) / |
| 300 ## - PHYSICAL DESCRIPTION | |
| Number of Pages | 1 online resource. |
| 505 0# - FORMATTED CONTENTS NOTE | |
| Remark 2 | Moore's Law: In the 21st Century / N.P. Maity and Reshmi Maity -- SiO2-Based MOS Devices: Leakage and Limitations / N.P. Maity and Reshmi Maity -- High-k Dielectric Materials: Structural Properties and Selection / P. Sri Harsha, K. Venkata Saravanan, and V. Madhurima -- Selection of High-k Dielectric Materials / N.P. Maity and Reshmi Maity -- Tunneling Current Density and Tunnel Resistivity: Application to High-k Material HfO2 / N.P. Maity and Reshmi Maity -- Analysis of Interface Charge Density: Application to High-k Material Tantalum Pentoxide / N.P. Maity and Reshmi Maity -- High-k Material Processing in CMOS VLSI Technology / Partha Pratim Sahu -- Tunnel FET: Working, Structure, and Modeling / Srimanta Baishya -- Heusler Compound: A Novel Material for Optoelectronic,Thermoelectric, and Spintronic Applications / D.P. Rai. |
| 520 ## - SUMMARY, ETC. | |
| Summary, etc | "This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components (or Moore's law). This book presents a broad review of SiO2 materials, including a brief historical note of Moore's law, followed by reliability issues of the SiO2 based MOS transistor. Then it discusses the transition of gate dielectrics with an EOT ~ 1 nm and a selection of high-k materials. A review of the different deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book. The volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working, structure, and modeling. This timely volume addresses the challenges of high-k gate dielectric materials and will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology. Key features: Discusses the state-of-the-art in high-k gate dielectric research for MOSFET in the nanoelectronics regime, reviews high-k applications in advanced MOS transistor structures, considers CMOS IC fabrication with high-k gate dielectric materials."-- |
| 650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| General subdivision | Materials. |
| 650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| General subdivision | Materials. |
| 700 1# - AUTHOR 2 | |
| Author 2 | Maity, Niladri Pratap, |
| 700 1# - AUTHOR 2 | |
| Author 2 | Maity, Reshmi, |
| 700 1# - AUTHOR 2 | |
| Author 2 | Baishya, Srimanta, |
| 856 40 - ELECTRONIC LOCATION AND ACCESS | |
| Uniform Resource Identifier | https://www.taylorfrancis.com/books/9780429325779 |
| 856 42 - ELECTRONIC LOCATION AND ACCESS | |
| Uniform Resource Identifier | http://www.oclc.org/content/dam/oclc/forms/terms/vbrl-201703.pdf |
| 942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
| Koha item type | eBooks |
| 264 #1 - | |
| -- | Burlington, ON, Canada ; |
| -- | Palm Bay, Florida, USA : |
| -- | Apple Academic Press, |
| -- | 2020. |
| 336 ## - | |
| -- | text |
| -- | txt |
| -- | rdacontent |
| 337 ## - | |
| -- | computer |
| -- | c |
| -- | rdamedia |
| 338 ## - | |
| -- | online resource |
| -- | cr |
| -- | rdacarrier |
| 520 ## - SUMMARY, ETC. | |
| -- | Provided by publisher. |
| 588 ## - | |
| -- | OCLC-licensed vendor bibliographic record. |
| 650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| -- | Gate array circuits |
| 650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| -- | Metal oxide semiconductors |
| 650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| -- | Dielectrics. |
| 650 #7 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| -- | SCIENCE / General |
| 650 #7 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| -- | SCIENCE / Physics |
| 650 #7 - SUBJECT ADDED ENTRY--SUBJECT 1 | |
| -- | TECHNOLOGY / Electronics / Microelectronics |
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