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Chemical vapour deposition : (Record no. 82909)

000 -LEADER
fixed length control field 05313nam a2200709 i 4500
001 - CONTROL NUMBER
control field 9780750331074
003 - CONTROL NUMBER IDENTIFIER
control field IOP
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20230516170310.0
006 - FIXED-LENGTH DATA ELEMENTS--ADDITIONAL MATERIAL CHARACTERISTICS
fixed length control field m eo d
007 - PHYSICAL DESCRIPTION FIXED FIELD--GENERAL INFORMATION
fixed length control field cr cn |||m|||a
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 230109s2022 enka fob 000 0 eng d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9780750331074
Qualifying information ebook
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9780750331067
Qualifying information mobi
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
Canceled/invalid ISBN 9780750331050
Qualifying information print
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
Canceled/invalid ISBN 9780750331081
Qualifying information myPrint
024 7# - OTHER STANDARD IDENTIFIER
Standard number or code 10.1088/978-0-7503-3107-4
Source of number or code doi
035 ## - SYSTEM CONTROL NUMBER
System control number (CaBNVSL)thg00083527
035 ## - SYSTEM CONTROL NUMBER
System control number (OCoLC)1358413750
040 ## - CATALOGING SOURCE
Original cataloging agency CaBNVSL
Language of cataloging eng
Description conventions rda
Transcribing agency CaBNVSL
Modifying agency CaBNVSL
050 #4 - LIBRARY OF CONGRESS CALL NUMBER
Classification number TS695
Item number .L373 2022eb
072 #7 - SUBJECT CATEGORY CODE
Subject category code PNRX
Source bicssc
072 #7 - SUBJECT CATEGORY CODE
Subject category code TEC021040
Source bisacsh
082 04 - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 671.735
Edition number 23
100 1# - MAIN ENTRY--PERSONAL NAME
Personal name Larsson, Karin,
Dates associated with a name 1955-
Relator term author.
9 (RLIN) 70812
245 10 - TITLE STATEMENT
Title Chemical vapour deposition :
Remainder of title growth processes on an atomic level /
Statement of responsibility, etc. Karin Larsson.
264 #1 - PRODUCTION, PUBLICATION, DISTRIBUTION, MANUFACTURE, AND COPYRIGHT NOTICE
Place of production, publication, distribution, manufacture Bristol [England] (Temple Circus, Temple Way, Bristol BS1 6HG, UK) :
Name of producer, publisher, distributor, manufacturer IOP Publishing,
Date of production, publication, distribution, manufacture, or copyright notice [2022]
300 ## - PHYSICAL DESCRIPTION
Extent 1 online resource (various pagings) :
Other physical details illustrations (some color).
336 ## - CONTENT TYPE
Content type term text
Source rdacontent
337 ## - MEDIA TYPE
Media type term electronic
Source isbdmedia
338 ## - CARRIER TYPE
Carrier type term online resource
Source rdacarrier
490 1# - SERIES STATEMENT
Series statement [IOP release $release]
490 1# - SERIES STATEMENT
Series statement IOP ebooks. [2022 collection]
500 ## - GENERAL NOTE
General note "Version: 20221201"--Title page verso.
504 ## - BIBLIOGRAPHY, ETC. NOTE
Bibliography, etc. note Includes bibliographical references.
505 0# - FORMATTED CONTENTS NOTE
Formatted contents note 1. Introduction -- 1.1. Chemical vapour phase deposition -- 1.2. Overview of thin film characterization techniques -- 1.3. Theoretical modelling and simulations
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 2. Common CVD reactor setups -- 2.1. General -- 2.2. Classification of CVD reactors
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 3. CVD processes on an atomic level -- 3.1. Introduction -- 3.2. Chemical reactions in the substrate/thin film interface -- 3.3. Chemical reactions in the thin film/gas interface
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 4. Theoretical methods and methodologies -- 4.1. General -- 4.2. The Schr�odinger equation -- 4.3. The density functional theory method -- 4.4. Geometry optimizations -- 4.5. Transition state search -- 4.6. Process energies -- 4.7. Property analysis methods
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 5. Construction of solid surface models -- 5.1. Surfaces within materials science of today -- 5.2. Surface reactivities -- 5.3. Surface planes -- 5.4. Surface morphologies -- 5.5. Surface relaxation -- 5.6. Surface reconstruction -- 5.7. Construction of model surfaces for CVD simulations
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 6. Thermodynamic modelling of CVD growth processes -- 6.1. General -- 6.2. Stability of non-terminated surfaces -- 6.3. Surface termination -- 6.4. Creation of surface reactive sites -- 6.5. Adsorption of growth species -- 6.6. Identification of the rate-limiting step in the CVD growth of diamond -- 6.7. Influence of dopants on the growth process
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 7. Identification of growth mechanisms for ALD deposition of Cu -- 7.1. General -- 7.2. Test-calculations -- 7.3. Adsorption of Cu-containing growth species -- 7.4. Disproportionation of the copper(I)chloride molecule -- 7.5. Removal of Cl from the CuCl adsorbate -- 7.6. Reaction barriers
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 8. Prerequisites for vapour phase growth of phase pure cubic BN -- 8.1. Energetical vapour phase deposition -- 8.2. Gentle chemical vapour phase deposition -- 8.3. Termination of the c-BN surface -- 8.4. Adsorption of growth species on the c-BN surface -- 8.5. Surface migration during growth of c-BN
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 9. Effect of substrates on the vapour phase growth of thin film materials -- 9.1. Substrate effect on the vapour phase growth of c-BN -- 9.2. Combined effect of substrate and terminating species on the vapour phase growth of c-BN -- 9.3. Electron bond populations -- 9.4. Degree of electron transfer -- 9.5. Conclusions
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 10. Construction of growth reaction pathways -- 10.1. Simulation of an experimentally suggested c-BN growth mechanism
505 8# - FORMATTED CONTENTS NOTE
Formatted contents note 11. Other types of material growth in a CVD reactor -- 11.1. Diamond-to-graphene transformation.
520 3# - SUMMARY, ETC.
Summary, etc. Chemical vapour deposition (CVD) is a vacuum deposition method used to produce high-quality, high-performance, solid materials. This is the first book to cover CVD growth processes at the atomic level using a combination of theoretical and experimental tools, including density functional theory (DFT) calculations.
521 ## - TARGET AUDIENCE NOTE
Target audience note Researchers active in the field of CVD.
530 ## - ADDITIONAL PHYSICAL FORM AVAILABLE NOTE
Additional physical form available note Also available in print.
538 ## - SYSTEM DETAILS NOTE
System details note Mode of access: World Wide Web.
538 ## - SYSTEM DETAILS NOTE
System details note System requirements: Adobe Acrobat Reader, EPUB reader, or Kindle reader.
545 ## - BIOGRAPHICAL OR HISTORICAL DATA
Biographical or historical data Karin Larsson is a Professor Emerita of Inorganic Chemistry at the Department of Chemistry-Angstrom Laboratory, Uppsala University, Sweden.
588 0# - SOURCE OF DESCRIPTION NOTE
Source of description note Title from PDF title page (viewed on January 9, 2023).
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Chemical vapor deposition.
9 (RLIN) 8008
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Surface chemistry & adsorption.
Source of heading or term bicssc
9 (RLIN) 70813
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element TECHNOLOGY & ENGINEERING / Materials Science / Thin Films, Surfaces & Interfaces.
Source of heading or term bisacsh
9 (RLIN) 70814
710 2# - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element Institute of Physics (Great Britain),
Relator term publisher.
9 (RLIN) 11622
776 08 - ADDITIONAL PHYSICAL FORM ENTRY
Relationship information Print version:
International Standard Book Number 9780750331050
-- 9780750331081
830 #0 - SERIES ADDED ENTRY--UNIFORM TITLE
Uniform title IOP (Series).
Name of part/section of a work Release 22.
9 (RLIN) 70815
830 #0 - SERIES ADDED ENTRY--UNIFORM TITLE
Uniform title IOP ebooks.
Name of part/section of a work 2022 collection.
9 (RLIN) 70816
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier <a href="https://iopscience.iop.org/book/mono/978-0-7503-3107-4">https://iopscience.iop.org/book/mono/978-0-7503-3107-4</a>
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type eBooks

No items available.