Advanced Concepts and Architectures for Plasma-Enabled Material Processing (Record no. 85819)

000 -LEADER
fixed length control field 03750nam a22006375i 4500
001 - CONTROL NUMBER
control field 978-3-031-02035-3
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20240730164641.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 220601s2020 sz | s |||| 0|eng d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 9783031020353
-- 978-3-031-02035-3
082 04 - CLASSIFICATION NUMBER
Call Number 620
100 1# - AUTHOR NAME
Author Baranov, Oleg O.
245 10 - TITLE STATEMENT
Title Advanced Concepts and Architectures for Plasma-Enabled Material Processing
250 ## - EDITION STATEMENT
Edition statement 1st ed. 2020.
300 ## - PHYSICAL DESCRIPTION
Number of Pages VIII, 82 p.
490 1# - SERIES STATEMENT
Series statement Synthesis Lectures on Emerging Engineering Technologies,
505 0# - FORMATTED CONTENTS NOTE
Remark 2 Introduction -- Technological Plasmas and Typical Schematics -- Plasma Parameters with Respect to Material Processing -- How to Control Plasma Parameters -- Material Processing -- Perspectives and Trends -- Conclusion -- Authors' Biographies.
520 ## - SUMMARY, ETC.
Summary, etc Plasma-based techniques are widely and successfully used across the field of materials processing, advanced nanosynthesis, and nanofabrication. The diversity of currently available processing architectures based on or enhanced by the use of plasmas is vast, and one can easily get lost in the opportunities presented by each of these configurations. This mini-book provides a concise outline of the most important concepts and architectures in plasma-assisted processing of materials, helping the reader navigate through the fundamentals of plasma system selection and optimization. Architectures discussed in this book range from the relatively simple, user-friendly types of plasmas produced using direct current, radio-frequency, microwave, and arc systems, to more sophisticated advanced systems based on incorporating and external substrate architectures, and complex control mechanisms of configured magnetic fields and distributed plasma sources.
700 1# - AUTHOR 2
Author 2 Levchenko, Igor.
700 1# - AUTHOR 2
Author 2 Xu, Shuyan.
700 1# - AUTHOR 2
Author 2 Bazaka, Kateryna.
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier https://doi.org/10.1007/978-3-031-02035-3
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type eBooks
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-- Cham :
-- Springer International Publishing :
-- Imprint: Springer,
-- 2020.
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-- txt
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-- computer
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-- rdamedia
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-- online resource
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-- text file
-- PDF
-- rda
650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Engineering.
650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Electrical engineering.
650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Electronic circuits.
650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Computers.
650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Materials science.
650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Surfaces (Technology).
650 #0 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Thin films.
650 14 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Technology and Engineering.
650 24 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Electrical and Electronic Engineering.
650 24 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Electronic Circuits and Systems.
650 24 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Computer Hardware.
650 24 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Materials Science.
650 24 - SUBJECT ADDED ENTRY--SUBJECT 1
-- Surfaces, Interfaces and Thin Film.
830 #0 - SERIES ADDED ENTRY--UNIFORM TITLE
-- 2381-1439
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-- ZDB-2-SXSC

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