Reliability wearout mechanisms in advanced CMOS technologies / Alvin W. Strong ... [et al.].
Contributor(s): Strong, Alvin Wayne | Wiley [publisher.] | IEEE Xplore (Online Service) [distributor.].
Material type:![materialTypeLabel](/opac-tmpl/lib/famfamfam/BK.png)
Includes bibliographical references and index.
Introduction / Alvin W. Strong -- Dielectric characterization and reliability methodology / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Su�n�e -- Dielectric breakdown of gate oxides: physics and experiments / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Su�n�e -- Negative bias temperature instabilities in pMOSFET devices / Giuseppe LaRosa -- Hot carriers / Stewart E. Rauch, III -- Stress-induced voiding / Timothy D. Sullivan -- Electromigration / Timothy D. Sullivan.
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