000			02883nam a22005535i 4500
001			978-4-431-54795-2
003			DE-He213
005			20200421111703.0
007			cr nn 008mamaa
008			140128s2014 ja | s |||| 0|eng d
020			_a9784431547952 _9978-4-431-54795-2
024	7		_a10.1007/978-4-431-54795-2 _2doi
050		4	_aT174.7
072		7	_aTDPB _2bicssc
072		7	_aTEC027000 _2bisacsh
082	0	4	_a620.5 _223
100	1		_aSamukawa, Seiji. _eauthor.
245	1	0	_aFeature Profile Evolution in Plasma Processing Using On-wafer Monitoring System _h[electronic resource] / _cby Seiji Samukawa.
264		1	_aTokyo : _bSpringer Japan : _bImprint: Springer, _c2014.
300			_aVIII, 40 p. 35 illus., 30 illus. in color. _bonline resource.
336			_atext _btxt _2rdacontent
337			_acomputer _bc _2rdamedia
338			_aonline resource _bcr _2rdacarrier
347			_atext file _bPDF _2rda
490	1		_aSpringerBriefs in Applied Sciences and Technology, _x2191-530X
505	0		_aIntroduction -- On-wafer UV sensor and prediction of UV irradiation damage -- Prediction of Abnormal Etching Profiles in High-aspect-ratio Via/Hole Etching Using On-wafer Monitoring System -- Feature Profile Evolution in Plasma Processing Using Wireless On-wafer Monitoring System.
520			_aThis book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described.
650		0	_aEngineering.
650		0	_aPlasma (Ionized gases).
650		0	_aNanoscale science.
650		0	_aNanoscience.
650		0	_aNanostructures.
650		0	_aSemiconductors.
650		0	_aNanotechnology.
650	1	4	_aEngineering.
650	2	4	_aNanotechnology and Microengineering.
650	2	4	_aNanoscale Science and Technology.
650	2	4	_aNanotechnology.
650	2	4	_aPlasma Physics.
650	2	4	_aSemiconductors.
710	2		_aSpringerLink (Online service)
773	0		_tSpringer eBooks
776	0	8	_iPrinted edition: _z9784431547945
830		0	_aSpringerBriefs in Applied Sciences and Technology, _x2191-530X
856	4	0	_uhttp://dx.doi.org/10.1007/978-4-431-54795-2
912			_aZDB-2-ENG
942			_cEBK
999			_c55082 _d55082