000 03408nam a22005895i 4500
001 978-3-642-36535-5
003 DE-He213
005 20200421112043.0
007 cr nn 008mamaa
008 130626s2013 gw | s |||| 0|eng d
020 _a9783642365355
_9978-3-642-36535-5
024 7 _a10.1007/978-3-642-36535-5
_2doi
050 4 _aTK7800-8360
050 4 _aTK7874-7874.9
072 7 _aTJF
_2bicssc
072 7 _aTEC008000
_2bisacsh
072 7 _aTEC008070
_2bisacsh
082 0 4 _a621.381
_223
245 1 0 _aHigh Permittivity Gate Dielectric Materials
_h[electronic resource] /
_cedited by Samares Kar.
264 1 _aBerlin, Heidelberg :
_bSpringer Berlin Heidelberg :
_bImprint: Springer,
_c2013.
300 _aXXXII, 489 p. 325 illus., 168 illus. in color.
_bonline resource.
336 _atext
_btxt
_2rdacontent
337 _acomputer
_bc
_2rdamedia
338 _aonline resource
_bcr
_2rdacarrier
347 _atext file
_bPDF
_2rda
490 1 _aSpringer Series in Advanced Microelectronics,
_x1437-0387 ;
_v43
505 0 _aHistorical Perspectives -- High Mobility Channels -- Non-Volatile Memory -- Hafnium-Based Gate Dielectric Materials -- Lanthanum-Based High-K Gate Dielectric Materials -- Crystalline High-K Gate Dielectric Materials -- High-K Gate Dielectric Processing.- Metal Gate Electrodes -- Flat-Band/Threshold Voltage Control -- Interfaces and Defects -- Electrical Characterization and Parameter Extraction -- Non-Contact Metrology of High-K Gate Dielectrics -- Channel Mobility -- High-K Gate Dielectric Reliability Issues -- Bias Temperature Instability -- Integration Issues.  .
520 _a"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects.".
650 0 _aEngineering.
650 0 _aSolid state physics.
650 0 _aSpectroscopy.
650 0 _aMicroscopy.
650 0 _aElectronics.
650 0 _aMicroelectronics.
650 0 _aOptical materials.
650 0 _aElectronic materials.
650 1 4 _aEngineering.
650 2 4 _aElectronics and Microelectronics, Instrumentation.
650 2 4 _aOptical and Electronic Materials.
650 2 4 _aSolid State Physics.
650 2 4 _aSpectroscopy and Microscopy.
650 2 4 _aEngineering, general.
700 1 _aKar, Samares.
_eeditor.
710 2 _aSpringerLink (Online service)
773 0 _tSpringer eBooks
776 0 8 _iPrinted edition:
_z9783642365348
830 0 _aSpringer Series in Advanced Microelectronics,
_x1437-0387 ;
_v43
856 4 0 _uhttp://dx.doi.org/10.1007/978-3-642-36535-5
912 _aZDB-2-ENG
942 _cEBK
999 _c56752
_d56752