000 04117cam a2200553Ii 4500
001 ocn978248367
003 OCoLC
005 20220711203424.0
006 m o d
007 cr cnu|||unuuu
008 170321t20172017gw a ob 001 0 eng d
040 _aN$T
_beng
_erda
_epn
_cN$T
_dN$T
_dIDEBK
_dDG1
_dYDX
_dOCLCF
_dCOO
_dNRC
_dRECBK
_dUPM
_dINU
_dCNCGM
_dOCLCQ
_dDEBSZ
019 _a978460974
_a978971419
_a979049927
_a979839774
_a980272350
_a980477366
_a980725307
_a981084644
_a981648933
_a981963663
_a982010739
020 _a9783527694822
_q(electronic bk.)
020 _a352769482X
_q(electronic bk.)
020 _a9783527694815
_q(electronic bk.)
020 _a3527694811
_q(electronic bk.)
020 _z9783527339129
020 _z3527339124
029 1 _aCHVBK
_b483028835
029 1 _aCHNEW
_b000948408
029 1 _aAU@
_b000060619833
029 1 _aDEBSZ
_b491140193
035 _a(OCoLC)978248367
_z(OCoLC)978460974
_z(OCoLC)978971419
_z(OCoLC)979049927
_z(OCoLC)979839774
_z(OCoLC)980272350
_z(OCoLC)980477366
_z(OCoLC)980725307
_z(OCoLC)981084644
_z(OCoLC)981648933
_z(OCoLC)981963663
_z(OCoLC)982010739
050 4 _aTS695
072 7 _aTEC
_x009070
_2bisacsh
082 0 4 _a621.38152
_223
049 _aMAIN
100 1 _aBachmann, Julien,
_d1978-
_eauthor.
_97504
245 1 0 _aAtomic layer deposition in energy conversion applications /
_cJulien Bachmann.
264 1 _aWeinheim, Germany :
_bWiley-VCH,
_c[2017].
264 4 _c©2017
300 _a1 online resource :
_billustrations.
336 _atext
_btxt
_2rdacontent
337 _acomputer
_bc
_2rdamedia
338 _aonline resource
_bcr
_2rdacarrier
505 0 _aIntroduction to Atomic Layer Deposition. Basics of Atomic Layer Deposition: Growth Characteristics and Conformality / Jolien Dendooven, Christophe Detavernier -- Atomic Layer Deposition in Photovoltaic Devices. Atomic Layer Deposition for High-Efficiency Crystalline Silicon Solar Cells / Bart Macco, Bas W H Loo, Wilhelmus M M Kessels -- ALD for Light Absorption / Alex Martinson -- Atomic Layer Deposition for Surface and Interface Engineering in Nanostructured Photovoltaic Devices / Carlos Guerra-Nuñez, Hyung Gyu Park, Ivo Utke -- ALD toward Electrochemical Energy Storage. Atomic Layer Deposition of Electrocatalysts for Use in Fuel Cells and Electrolyzers / Lifeng Liu -- Atomic Layer Deposition for Thin-Film Lithium-Ion Batteries / Ola Nilsen, Knut B Gandrud, Ruud Amund, Fjellvåg Helmer -- ALD-Processed Oxides for High-Temperature Fuel Cells / Michel Cassir, Arturo Meléndez-Ceballos, Marie-Hélène Chavanne, Dorra Dallel, Armelle Ringuedé -- ALD in Photoelectrochemical and Thermoelectric Energy Conversion.ALD for Photoelectrochemical Water Splitting / Lionel Santinacci -- Atomic Layer Deposition of Thermoelectric Materials / Maarit Karppinen, Antti J Karttunen.
504 _aIncludes bibliographical references and index.
588 0 _aVendor-supplied metadata.
520 _aCombining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.
650 0 _aAtomic layer deposition.
_97505
650 7 _aTECHNOLOGY & ENGINEERING / Mechanical
_2bisacsh
_97506
650 7 _aAtomic layer deposition.
_2fast
_0(OCoLC)fst01909248
_97505
655 4 _aElectronic books.
_93294
776 0 8 _cOriginal
_z3527339124
_z9783527339129
_w(OCoLC)962353236
856 4 0 _uhttps://doi.org/10.1002/9783527694822
_zWiley Online Library
942 _cEBK
994 _a92
_bDG1
999 _c68896
_d68896