000 01942cam a2200385Ii 4500
001 9781315372440
008 180331t20172017fluad ob 001 0 eng d
020 _a9781315372440
_q(e-book : PDF)
020 _a9781482254365
_q(e-book: PDF)
020 _a9781315336114
_q(e-book: Mobi)
020 _z9781482254358
_q(hardback)
024 7 _a10.1201/9781315372440
_2doi
035 _a(OCoLC)966405310
040 _aFlBoTFG
_cFlBoTFG
_erda
050 4 _aQC611.8.C64
_bA94 2017
082 0 4 _a537.6226
_bA977
100 1 _aAyers, John E.,
_eauthor.
_914353
245 1 0 _aHeteroepitaxy of semiconductors :
_btheory, growth, and characterization /
_cJohn E. Ayers, University of Connecticut, Storrs, USA, Tedi Kujofsa, University of Connecticut, Storrs, USA, Paul Rango, University of Connecticut, Storrs, USA, Johanna E
250 _aSecond edition.
264 1 _aBoca Raton :
_bTaylor & Francis Group,
_c[2017]
264 4 _c©2017
300 _a1 online resource
336 _atext
_2rdacontent
337 _acomputer
_2rdamedia
338 _aonline resource
_2rdacarrier
505 0 _a1. Introduction -- 2. Properties of semiconductors -- 3. Heteroepitaxial growth -- 4. Surface and chemical considerations in heteroepitaxy -- 5. Mismatched heteroepitaxial growth and strain relaxation : I. Uniform layers -- 6. Mismatched heteroepitaxial growth and strain relaxation : II. Graded layers and multilayered structures -- 7. Characterization of heteroepitaxial layers -- 8. Defect engineering in heteroepitaxial material -- 9. Metamorphic devices.
650 0 _aCompound semiconductors.
_914354
650 0 _aEpitaxy.
_98017
700 1 _aKujofsa, Tedi,
_eauthor.
_914355
700 1 _aRango, Paul,
_eauthor.
_914356
700 1 _aRaphael, Johanna E.,
_eauthor.
_914357
776 0 8 _iPrint version:
_z9781482254358
_w(DLC) 2016013249
856 4 0 _uhttps://www.taylorfrancis.com/books/9781482254365
_zClick here to view.
942 _cEBK
999 _c70685
_d70685