000 03429cam a2200349Ii 4500
001 9781315181257
008 180706t20172017si ad ob 001 0 eng d
020 _a9781315181257
_q(e-book : PDF)
020 _a9781351721769
_q(e-book: Mobi)
020 _z9789814774222
_q(hardback)
024 7 _a10.1201/9781315181257
_2doi
035 _a(OCoLC)993959235
040 _aFlBoTFG
_cFlBoTFG
_erda
050 4 _aTA418.9.N35
_bI58 2017
082 0 4 _a620.5
_bI611
245 0 0 _aIntegrated Nanodevice and Nanosystem Fabrication :
_bBreakthroughs and Alternatives /
_cedited by Simon Deleonibus.
264 1 _aSingapore :
_bPan Stanford Publishing,
_c[2017]
264 4 _c©2017
300 _a1 online resource (xx, 326 pages)
336 _atext
_2rdacontent
337 _acomputer
_2rdamedia
338 _aonline resource
_2rdacarrier
490 0 _aPan Stanford Series on Intelligent Nanosystems
505 0 0 _tpart PART I: NANOFABRICATION TECHNIQUES FOR EMERGING MATERIALS AND DEVICES --
_tchapter 1 Deterministic Single-Ion Implantation Method for Quantum Processing in Silicon and Diamond /
_rTakahiro Shinada --
_tchapter 2 Graphene and Two-Dimensional Materials: Extending Silicon Technology for the Future? /
_rAndreas Bablich --
_tchapter 3 Nanofabrication Using Scanning Probe Microscopes /
_rVincent Bouchiat --
_tpart PART II: THE SECOND LIFE AND NEW OPPORTUNITIES FOR SILICON CMOS --
_tchapter 4 High-? Dielectric Scaling for Nano-CMOS Technology /
_rHei Wong --
_tchapter 5 Nanometer-Scale Epitaxial Growth of Group IV Semiconductors /
_rJunichi Murota --
_tchapter 6 TCAD-Based Design Technology Co-optimization for Variability in Nanoscale SOI FinFETs /
_rXingsheng Wang --
_tchapter 7 Nanowires for CMOS and Diversifications /
_rThomas Ernst.
520 _a"Since its invention, the integrated circuit has necessitated new process modules and numerous architectural changes to improve application performances, power consumption, and cost reduction. Silicon CMOS is now well established to offer the integration of several tens of billions of devices on a chip or in a system. At present, there are important challenges in the introduction of heterogeneous co-integration of materials and devices with the silicon CMOS 2D- and 3D-based platforms. New fabrication techniques allowing strong energy and variability efficiency come in as possible players to improve the various figures of merit of fabrication technology. Integrated Nanodevice and Nanosystem Fabrication: Breakthroughs and Alternatives is the second volume in the Pan Stanford Series on Intelligent Nanosystems. The book contains 8 chapters and is divided into two parts, the first of which reports breakthrough materials and techniques such as single ion implantation in silicon and diamond, graphene and 2D materials, nanofabrication using scanning probe microscopes, while the second tackles the scaling and architectural aspects of silicon devices through HiK scaling for nanoCMOS, nanoscale epitaxial growth of group IV semiconductors, design for variability co-optimization in SOI FinFETs, and nanowires for CMOS and diversifications."--Provided by publisher.
650 0 _aNanostructured materials.
_94537
650 0 _aNanomanufacturing.
_917398
700 1 _aDeleonibus, Simon,
_eeditor.
_917399
776 0 8 _iPrint version:
_z9789814774222
856 4 0 _uhttps://www.taylorfrancis.com/books/9781315181257
_zClick here to view.
942 _cEBK
999 _c71516
_d71516