000 05487nam a2200685 i 4500
001 9780750326520
003 IOP
005 20230516170221.0
006 m eo d
007 cr cn |||m|||a
008 211009s2021 enka fob 000 0 eng d
020 _a9780750326520
_qebook
020 _a9780750326513
_qmobi
020 _z9780750326506
_qprint
020 _z9780750326537
_qmyPrint
024 7 _a10.1088/978-0-7503-2652-0
_2doi
035 _a(CaBNVSL)thg00082641
040 _aCaBNVSL
_beng
_erda
_cCaBNVSL
_dCaBNVSL
050 4 _aTK7872.M3
_bL444 2021eb
072 7 _aPHJ
_2bicssc
072 7 _aSCI053000
_2bisacsh
082 0 4 _a621.381531
_223
100 1 _aLee, Yen-Min,
_eauthor.
_970239
245 1 0 _aEfficient extreme ultraviolet mirror design :
_ban FDTD approach /
_cYen-Min Lee.
264 1 _aBristol [England] (Temple Circus, Temple Way, Bristol BS1 6HG, UK) :
_bIOP Publishing,
_c[2021]
300 _a1 online resource (various pagings) :
_billustrations (some color).
336 _atext
_2rdacontent
337 _aelectronic
_2isbdmedia
338 _aonline resource
_2rdacarrier
490 1 _a[IOP release $release]
490 1 _aIOP series in advances in optics, photonics and optoelectronics
490 1 _aIOP ebooks. [2021 collection]
500 _a"Version: 202109"--Title page verso.
504 _aIncludes bibliographical references.
505 0 _a1. Introduction to optical lithography -- 1.1. Principle of optical lithography -- 1.2. Evolution and history -- 1.3. Interrelation with IC manufacturing -- 1.4. The next-generation optical lithography : extreme ultraviolet (EUV) lithography
505 8 _a2. Multilayer mirrors in extreme ultraviolet lithography -- 2.1. Composition and fabrication -- 2.2. ML based EUV photomasks -- 2.3. Multilayer mirror physics -- 2.4. Quarter-wavelength EUV mirror (Bragg mirror) -- 2.5. Photonic crystal (PHC) EUV mirror
505 8 _a3. Efficient finite-difference time-domain (FDTD) approach -- 3.1. Numerical methods for EUV mirror design -- 3.2. FDTD expression for Maxwell's equation -- 3.3. Boundary conditions -- 3.4. Efficient FDTD method--the equivalent layer approach
505 8 _a4. Simulation cases -- 4.1. 2D simulation : EUV mirror with surface roughness -- 4.2. 3D simulation : EUV mirror patterned with periodic contact holes -- 4.3. 3D simulation : porous EUV mirror
505 8 _a5. Summaries and challenges -- 5.1. Summaries -- 5.2. Challenges.
520 3 _aExtreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel's equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method.
521 _aOptical engineers, upper level undergrad and grad level students, lens design, optomechanics, scientists, researchers.
530 _aAlso available in print.
538 _aMode of access: World Wide Web.
538 _aSystem requirements: Adobe Acrobat Reader, EPUB reader, or Kindle reader.
545 _aDr Yen-Min Lee obtained his PhD from the National Taiwan University (Taipei, Taiwan) before joining ASML Holding as a mechatronics engineer in their motion design group in the USA. He went on to join the optical design group at Eindhoven and served as a senior physics engineer in the optical metrology group (Linkou, Taiwan). His research interests include computational lithography, large-scale electromagnetic problems, parallel computing, inverse algorithms, optical metrology, and medical imaging.
588 0 _aTitle from PDF title page (viewed on October 9, 2021).
650 0 _aExtreme ultraviolet lithography.
_970240
650 0 _aMirrors
_xDesign and construction.
_970241
650 0 _aFinite differences
_xData processing.
_970242
650 0 _aTime-domain analysis.
_97250
650 7 _aOptical physics.
_2bicssc
_970243
650 7 _aOptics and photonics.
_2bisacsh
_918815
710 2 _aInstitute of Physics (Great Britain),
_epublisher.
_911622
776 0 8 _iPrint version:
_z9780750326506
_z9780750326537
830 0 _aIOP (Series).
_pRelease 21.
_970244
830 0 _aIOP series in advances in optics, photonics and optoelectronics.
_970245
830 0 _aIOP ebooks.
_p2021 collection.
_970246
856 4 0 _uhttps://iopscience.iop.org/book/978-0-7503-2652-0
942 _cEBK
999 _c82805
_d82805