000 | 05313nam a2200709 i 4500 | ||
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001 | 9780750331074 | ||
003 | IOP | ||
005 | 20230516170310.0 | ||
006 | m eo d | ||
007 | cr cn |||m|||a | ||
008 | 230109s2022 enka fob 000 0 eng d | ||
020 |
_a9780750331074 _qebook |
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020 |
_a9780750331067 _qmobi |
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020 |
_z9780750331050 _qprint |
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020 |
_z9780750331081 _qmyPrint |
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024 | 7 |
_a10.1088/978-0-7503-3107-4 _2doi |
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035 | _a(CaBNVSL)thg00083527 | ||
035 | _a(OCoLC)1358413750 | ||
040 |
_aCaBNVSL _beng _erda _cCaBNVSL _dCaBNVSL |
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050 | 4 |
_aTS695 _b.L373 2022eb |
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072 | 7 |
_aPNRX _2bicssc |
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072 | 7 |
_aTEC021040 _2bisacsh |
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082 | 0 | 4 |
_a671.735 _223 |
100 | 1 |
_aLarsson, Karin, _d1955- _eauthor. _970812 |
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245 | 1 | 0 |
_aChemical vapour deposition : _bgrowth processes on an atomic level / _cKarin Larsson. |
264 | 1 |
_aBristol [England] (Temple Circus, Temple Way, Bristol BS1 6HG, UK) : _bIOP Publishing, _c[2022] |
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300 |
_a1 online resource (various pagings) : _billustrations (some color). |
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336 |
_atext _2rdacontent |
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337 |
_aelectronic _2isbdmedia |
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338 |
_aonline resource _2rdacarrier |
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490 | 1 | _a[IOP release $release] | |
490 | 1 | _aIOP ebooks. [2022 collection] | |
500 | _a"Version: 20221201"--Title page verso. | ||
504 | _aIncludes bibliographical references. | ||
505 | 0 | _a1. Introduction -- 1.1. Chemical vapour phase deposition -- 1.2. Overview of thin film characterization techniques -- 1.3. Theoretical modelling and simulations | |
505 | 8 | _a2. Common CVD reactor setups -- 2.1. General -- 2.2. Classification of CVD reactors | |
505 | 8 | _a3. CVD processes on an atomic level -- 3.1. Introduction -- 3.2. Chemical reactions in the substrate/thin film interface -- 3.3. Chemical reactions in the thin film/gas interface | |
505 | 8 | _a4. Theoretical methods and methodologies -- 4.1. General -- 4.2. The Schr�odinger equation -- 4.3. The density functional theory method -- 4.4. Geometry optimizations -- 4.5. Transition state search -- 4.6. Process energies -- 4.7. Property analysis methods | |
505 | 8 | _a5. Construction of solid surface models -- 5.1. Surfaces within materials science of today -- 5.2. Surface reactivities -- 5.3. Surface planes -- 5.4. Surface morphologies -- 5.5. Surface relaxation -- 5.6. Surface reconstruction -- 5.7. Construction of model surfaces for CVD simulations | |
505 | 8 | _a6. Thermodynamic modelling of CVD growth processes -- 6.1. General -- 6.2. Stability of non-terminated surfaces -- 6.3. Surface termination -- 6.4. Creation of surface reactive sites -- 6.5. Adsorption of growth species -- 6.6. Identification of the rate-limiting step in the CVD growth of diamond -- 6.7. Influence of dopants on the growth process | |
505 | 8 | _a7. Identification of growth mechanisms for ALD deposition of Cu -- 7.1. General -- 7.2. Test-calculations -- 7.3. Adsorption of Cu-containing growth species -- 7.4. Disproportionation of the copper(I)chloride molecule -- 7.5. Removal of Cl from the CuCl adsorbate -- 7.6. Reaction barriers | |
505 | 8 | _a8. Prerequisites for vapour phase growth of phase pure cubic BN -- 8.1. Energetical vapour phase deposition -- 8.2. Gentle chemical vapour phase deposition -- 8.3. Termination of the c-BN surface -- 8.4. Adsorption of growth species on the c-BN surface -- 8.5. Surface migration during growth of c-BN | |
505 | 8 | _a9. Effect of substrates on the vapour phase growth of thin film materials -- 9.1. Substrate effect on the vapour phase growth of c-BN -- 9.2. Combined effect of substrate and terminating species on the vapour phase growth of c-BN -- 9.3. Electron bond populations -- 9.4. Degree of electron transfer -- 9.5. Conclusions | |
505 | 8 | _a10. Construction of growth reaction pathways -- 10.1. Simulation of an experimentally suggested c-BN growth mechanism | |
505 | 8 | _a11. Other types of material growth in a CVD reactor -- 11.1. Diamond-to-graphene transformation. | |
520 | 3 | _aChemical vapour deposition (CVD) is a vacuum deposition method used to produce high-quality, high-performance, solid materials. This is the first book to cover CVD growth processes at the atomic level using a combination of theoretical and experimental tools, including density functional theory (DFT) calculations. | |
521 | _aResearchers active in the field of CVD. | ||
530 | _aAlso available in print. | ||
538 | _aMode of access: World Wide Web. | ||
538 | _aSystem requirements: Adobe Acrobat Reader, EPUB reader, or Kindle reader. | ||
545 | _aKarin Larsson is a Professor Emerita of Inorganic Chemistry at the Department of Chemistry-Angstrom Laboratory, Uppsala University, Sweden. | ||
588 | 0 | _aTitle from PDF title page (viewed on January 9, 2023). | |
650 | 0 |
_aChemical vapor deposition. _98008 |
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650 | 7 |
_aSurface chemistry & adsorption. _2bicssc _970813 |
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650 | 7 |
_aTECHNOLOGY & ENGINEERING / Materials Science / Thin Films, Surfaces & Interfaces. _2bisacsh _970814 |
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710 | 2 |
_aInstitute of Physics (Great Britain), _epublisher. _911622 |
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776 | 0 | 8 |
_iPrint version: _z9780750331050 _z9780750331081 |
830 | 0 |
_aIOP (Series). _pRelease 22. _970815 |
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830 | 0 |
_aIOP ebooks. _p2022 collection. _970816 |
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856 | 4 | 0 | _uhttps://iopscience.iop.org/book/mono/978-0-7503-3107-4 |
942 | _cEBK | ||
999 |
_c82909 _d82909 |