000 05313nam a2200709 i 4500
001 9780750331074
003 IOP
005 20230516170310.0
006 m eo d
007 cr cn |||m|||a
008 230109s2022 enka fob 000 0 eng d
020 _a9780750331074
_qebook
020 _a9780750331067
_qmobi
020 _z9780750331050
_qprint
020 _z9780750331081
_qmyPrint
024 7 _a10.1088/978-0-7503-3107-4
_2doi
035 _a(CaBNVSL)thg00083527
035 _a(OCoLC)1358413750
040 _aCaBNVSL
_beng
_erda
_cCaBNVSL
_dCaBNVSL
050 4 _aTS695
_b.L373 2022eb
072 7 _aPNRX
_2bicssc
072 7 _aTEC021040
_2bisacsh
082 0 4 _a671.735
_223
100 1 _aLarsson, Karin,
_d1955-
_eauthor.
_970812
245 1 0 _aChemical vapour deposition :
_bgrowth processes on an atomic level /
_cKarin Larsson.
264 1 _aBristol [England] (Temple Circus, Temple Way, Bristol BS1 6HG, UK) :
_bIOP Publishing,
_c[2022]
300 _a1 online resource (various pagings) :
_billustrations (some color).
336 _atext
_2rdacontent
337 _aelectronic
_2isbdmedia
338 _aonline resource
_2rdacarrier
490 1 _a[IOP release $release]
490 1 _aIOP ebooks. [2022 collection]
500 _a"Version: 20221201"--Title page verso.
504 _aIncludes bibliographical references.
505 0 _a1. Introduction -- 1.1. Chemical vapour phase deposition -- 1.2. Overview of thin film characterization techniques -- 1.3. Theoretical modelling and simulations
505 8 _a2. Common CVD reactor setups -- 2.1. General -- 2.2. Classification of CVD reactors
505 8 _a3. CVD processes on an atomic level -- 3.1. Introduction -- 3.2. Chemical reactions in the substrate/thin film interface -- 3.3. Chemical reactions in the thin film/gas interface
505 8 _a4. Theoretical methods and methodologies -- 4.1. General -- 4.2. The Schr�odinger equation -- 4.3. The density functional theory method -- 4.4. Geometry optimizations -- 4.5. Transition state search -- 4.6. Process energies -- 4.7. Property analysis methods
505 8 _a5. Construction of solid surface models -- 5.1. Surfaces within materials science of today -- 5.2. Surface reactivities -- 5.3. Surface planes -- 5.4. Surface morphologies -- 5.5. Surface relaxation -- 5.6. Surface reconstruction -- 5.7. Construction of model surfaces for CVD simulations
505 8 _a6. Thermodynamic modelling of CVD growth processes -- 6.1. General -- 6.2. Stability of non-terminated surfaces -- 6.3. Surface termination -- 6.4. Creation of surface reactive sites -- 6.5. Adsorption of growth species -- 6.6. Identification of the rate-limiting step in the CVD growth of diamond -- 6.7. Influence of dopants on the growth process
505 8 _a7. Identification of growth mechanisms for ALD deposition of Cu -- 7.1. General -- 7.2. Test-calculations -- 7.3. Adsorption of Cu-containing growth species -- 7.4. Disproportionation of the copper(I)chloride molecule -- 7.5. Removal of Cl from the CuCl adsorbate -- 7.6. Reaction barriers
505 8 _a8. Prerequisites for vapour phase growth of phase pure cubic BN -- 8.1. Energetical vapour phase deposition -- 8.2. Gentle chemical vapour phase deposition -- 8.3. Termination of the c-BN surface -- 8.4. Adsorption of growth species on the c-BN surface -- 8.5. Surface migration during growth of c-BN
505 8 _a9. Effect of substrates on the vapour phase growth of thin film materials -- 9.1. Substrate effect on the vapour phase growth of c-BN -- 9.2. Combined effect of substrate and terminating species on the vapour phase growth of c-BN -- 9.3. Electron bond populations -- 9.4. Degree of electron transfer -- 9.5. Conclusions
505 8 _a10. Construction of growth reaction pathways -- 10.1. Simulation of an experimentally suggested c-BN growth mechanism
505 8 _a11. Other types of material growth in a CVD reactor -- 11.1. Diamond-to-graphene transformation.
520 3 _aChemical vapour deposition (CVD) is a vacuum deposition method used to produce high-quality, high-performance, solid materials. This is the first book to cover CVD growth processes at the atomic level using a combination of theoretical and experimental tools, including density functional theory (DFT) calculations.
521 _aResearchers active in the field of CVD.
530 _aAlso available in print.
538 _aMode of access: World Wide Web.
538 _aSystem requirements: Adobe Acrobat Reader, EPUB reader, or Kindle reader.
545 _aKarin Larsson is a Professor Emerita of Inorganic Chemistry at the Department of Chemistry-Angstrom Laboratory, Uppsala University, Sweden.
588 0 _aTitle from PDF title page (viewed on January 9, 2023).
650 0 _aChemical vapor deposition.
_98008
650 7 _aSurface chemistry & adsorption.
_2bicssc
_970813
650 7 _aTECHNOLOGY & ENGINEERING / Materials Science / Thin Films, Surfaces & Interfaces.
_2bisacsh
_970814
710 2 _aInstitute of Physics (Great Britain),
_epublisher.
_911622
776 0 8 _iPrint version:
_z9780750331050
_z9780750331081
830 0 _aIOP (Series).
_pRelease 22.
_970815
830 0 _aIOP ebooks.
_p2022 collection.
_970816
856 4 0 _uhttps://iopscience.iop.org/book/mono/978-0-7503-3107-4
942 _cEBK
999 _c82909
_d82909