Handbook of photomask manufacturing technology /
edited by Syed Rizvi.
- 1 online resource (xxiii, 704 pages)
part section I Introduction -- chapter 1 Introduction to Mask Making / part section II Mask Writing -- chapter 2 Data Preparation / chapter 3 Mask Writers: An Overview / chapter 4 E-Beam Mask Writers / chapter 5 Laser Mask Writers / part section III Optical Masks -- chapter 6 Optical Masks: An Overview / chapter 7 Conventional Optical Masks / chapter 8 Advanced Optical Masks / part section IV NGL Masks -- chapter 9 NGL Masks: An Overview / chapter 10 Masks for Electron Beam Projection Lithography / chapter 11 Masks for Extreme Ultraviolet Lithography / chapter 12 Masks for Ion Projection Lithography / chapter 13 Mask for Proximity X-Ray Lithography / part section V Mask Processing, Materials, and Pellicles -- chapter 14 Mask Substrate / chapter 15 Resists for Mask Making / chapter 16 Resist Charging and Heating / chapter 17 Mask Processing / chapter 18 Mask Materials: Optical Properties / chapter 19 Pellicles / part section VI Mask Metrology, Inspection, Evaluation, and Repairs -- chapter 20 Photomask Feature Metrology. James Potzick -- chapter 21 Optical Critical Dimension Metrology / chapter 22 Photomask Critical Dimension Metrology in the Scanning Electron Microscope*,** / chapter 23 Geometrical Characterization of Masks Using SPM / chapter 24 Metrology of Image Placement / chapter 25 Optical Thin-Film Metrology for Photomask Applications / chapter 26 Phase Measurement Tool for PSM / chapter 27 Mask Inspection: Theories and Principles / chapter 28 Tool for Inspecting Masks: Lasertec MD 2500 / chapter 29 Tools for Mask Image Evaluation / chapter 30 Mask Repair / part section VII Modeling and Simulation -- chapter 31 Modeling and Simulation / Andrew G. Zanzal -- Paul J.M. van Adrichem and Christian K. Kalus -- Sergey Babin -- Norio Saitou -- Christer Rydberg -- Nobuyuki Yoshioka -- Syed A. Rizvi -- Wilhelm Maurer -- Kurt R. Kimmel -- Hisatak Sano -- Pei-yang Yan -- Syed A. Rizvi -- Masatoshi Oda -- Syed A. Rizvi -- Benjamen Rathsack -- Min Bai -- Syed A. Rizvi -- Vladimir Liberman -- Yung-Tsai Yen -- Ray J. Hoobler -- Michael T. Postek -- Sylvain Muckenhirn -- Michael T. Takac -- Ebru Apak -- Hal Kusunose -- Anja Rosenbusch -- Makoto Yonezawa -- Axel Zibold -- Randall Lee -- Andreas Erdmann.
9781315220833 9781315220833 9781351828031
10.1201/9781420028782 doi
Masks (Electronics)--Handbooks, manuals, etc.
TK7872.M3 / H36 2005
621.381531 / H236
part section I Introduction -- chapter 1 Introduction to Mask Making / part section II Mask Writing -- chapter 2 Data Preparation / chapter 3 Mask Writers: An Overview / chapter 4 E-Beam Mask Writers / chapter 5 Laser Mask Writers / part section III Optical Masks -- chapter 6 Optical Masks: An Overview / chapter 7 Conventional Optical Masks / chapter 8 Advanced Optical Masks / part section IV NGL Masks -- chapter 9 NGL Masks: An Overview / chapter 10 Masks for Electron Beam Projection Lithography / chapter 11 Masks for Extreme Ultraviolet Lithography / chapter 12 Masks for Ion Projection Lithography / chapter 13 Mask for Proximity X-Ray Lithography / part section V Mask Processing, Materials, and Pellicles -- chapter 14 Mask Substrate / chapter 15 Resists for Mask Making / chapter 16 Resist Charging and Heating / chapter 17 Mask Processing / chapter 18 Mask Materials: Optical Properties / chapter 19 Pellicles / part section VI Mask Metrology, Inspection, Evaluation, and Repairs -- chapter 20 Photomask Feature Metrology. James Potzick -- chapter 21 Optical Critical Dimension Metrology / chapter 22 Photomask Critical Dimension Metrology in the Scanning Electron Microscope*,** / chapter 23 Geometrical Characterization of Masks Using SPM / chapter 24 Metrology of Image Placement / chapter 25 Optical Thin-Film Metrology for Photomask Applications / chapter 26 Phase Measurement Tool for PSM / chapter 27 Mask Inspection: Theories and Principles / chapter 28 Tool for Inspecting Masks: Lasertec MD 2500 / chapter 29 Tools for Mask Image Evaluation / chapter 30 Mask Repair / part section VII Modeling and Simulation -- chapter 31 Modeling and Simulation / Andrew G. Zanzal -- Paul J.M. van Adrichem and Christian K. Kalus -- Sergey Babin -- Norio Saitou -- Christer Rydberg -- Nobuyuki Yoshioka -- Syed A. Rizvi -- Wilhelm Maurer -- Kurt R. Kimmel -- Hisatak Sano -- Pei-yang Yan -- Syed A. Rizvi -- Masatoshi Oda -- Syed A. Rizvi -- Benjamen Rathsack -- Min Bai -- Syed A. Rizvi -- Vladimir Liberman -- Yung-Tsai Yen -- Ray J. Hoobler -- Michael T. Postek -- Sylvain Muckenhirn -- Michael T. Takac -- Ebru Apak -- Hal Kusunose -- Anja Rosenbusch -- Makoto Yonezawa -- Axel Zibold -- Randall Lee -- Andreas Erdmann.
9781315220833 9781315220833 9781351828031
10.1201/9781420028782 doi
Masks (Electronics)--Handbooks, manuals, etc.
TK7872.M3 / H36 2005
621.381531 / H236