part section I Introduction -- chapter 1 Introduction to Mask Making / Andrew G. Zanzal -- part section II Mask Writing -- chapter 2 Data Preparation / Paul J.M. van Adrichem and Christian K. Kalus -- chapter 3 Mask Writers: An Overview / Sergey Babin -- chapter 4 E-Beam Mask Writers / Norio Saitou -- chapter 5 Laser Mask Writers / Christer Rydberg -- part section III Optical Masks -- chapter 6 Optical Masks: An Overview / Nobuyuki Yoshioka -- chapter 7 Conventional Optical Masks / Syed A. Rizvi -- chapter 8 Advanced Optical Masks / Wilhelm Maurer -- part section IV NGL Masks -- chapter 9 NGL Masks: An Overview / Kurt R. Kimmel -- chapter 10 Masks for Electron Beam Projection Lithography / Hisatak Sano -- chapter 11 Masks for Extreme Ultraviolet Lithography / Pei-yang Yan -- chapter 12 Masks for Ion Projection Lithography / Syed A. Rizvi -- chapter 13 Mask for Proximity X-Ray Lithography / Masatoshi Oda -- part section V Mask Processing, Materials, and Pellicles -- chapter 14 Mask Substrate / Syed A. Rizvi -- chapter 15 Resists for Mask Making / Benjamen Rathsack -- chapter 16 Resist Charging and Heating / Min Bai -- chapter 17 Mask Processing / Syed A. Rizvi -- chapter 18 Mask Materials: Optical Properties / Vladimir Liberman -- chapter 19 Pellicles / Yung-Tsai Yen -- part section VI Mask Metrology, Inspection, Evaluation, and Repairs -- chapter 20 Photomask Feature Metrology. James Potzick -- chapter 21 Optical Critical Dimension Metrology / Ray J. Hoobler -- chapter 22 Photomask Critical Dimension Metrology in the Scanning Electron Microscope*,** / Michael T. Postek -- chapter 23 Geometrical Characterization of Masks Using SPM / Sylvain Muckenhirn -- chapter 24 Metrology of Image Placement / Michael T. Takac -- chapter 25 Optical Thin-Film Metrology for Photomask Applications / Ebru Apak -- chapter 26 Phase Measurement Tool for PSM / Hal Kusunose -- chapter 27 Mask Inspection: Theories and Principles / Anja Rosenbusch -- chapter 28 Tool for Inspecting Masks: Lasertec MD 2500 / Makoto Yonezawa -- chapter 29 Tools for Mask Image Evaluation / Axel Zibold -- chapter 30 Mask Repair / Randall Lee -- part section VII Modeling and Simulation -- chapter 31 Modeling and Simulation / Andreas Erdmann.