Efficient extreme ultraviolet mirror design : (Record no. 82805)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 05487nam a2200685 i 4500 |
| 001 - CONTROL NUMBER | |
| control field | 9780750326520 |
| 003 - CONTROL NUMBER IDENTIFIER | |
| control field | IOP |
| 005 - DATE AND TIME OF LATEST TRANSACTION | |
| control field | 20230516170221.0 |
| 006 - FIXED-LENGTH DATA ELEMENTS--ADDITIONAL MATERIAL CHARACTERISTICS | |
| fixed length control field | m eo d |
| 007 - PHYSICAL DESCRIPTION FIXED FIELD--GENERAL INFORMATION | |
| fixed length control field | cr cn |||m|||a |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 211009s2021 enka fob 000 0 eng d |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 9780750326520 |
| Qualifying information | ebook |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 9780750326513 |
| Qualifying information | mobi |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| Canceled/invalid ISBN | 9780750326506 |
| Qualifying information | |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| Canceled/invalid ISBN | 9780750326537 |
| Qualifying information | myPrint |
| 024 7# - OTHER STANDARD IDENTIFIER | |
| Standard number or code | 10.1088/978-0-7503-2652-0 |
| Source of number or code | doi |
| 035 ## - SYSTEM CONTROL NUMBER | |
| System control number | (CaBNVSL)thg00082641 |
| 040 ## - CATALOGING SOURCE | |
| Original cataloging agency | CaBNVSL |
| Language of cataloging | eng |
| Description conventions | rda |
| Transcribing agency | CaBNVSL |
| Modifying agency | CaBNVSL |
| 050 #4 - LIBRARY OF CONGRESS CALL NUMBER | |
| Classification number | TK7872.M3 |
| Item number | L444 2021eb |
| 072 #7 - SUBJECT CATEGORY CODE | |
| Subject category code | PHJ |
| Source | bicssc |
| 072 #7 - SUBJECT CATEGORY CODE | |
| Subject category code | SCI053000 |
| Source | bisacsh |
| 082 04 - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 621.381531 |
| Edition number | 23 |
| 100 1# - MAIN ENTRY--PERSONAL NAME | |
| Personal name | Lee, Yen-Min, |
| Relator term | author. |
| 9 (RLIN) | 70239 |
| 245 10 - TITLE STATEMENT | |
| Title | Efficient extreme ultraviolet mirror design : |
| Remainder of title | an FDTD approach / |
| Statement of responsibility, etc. | Yen-Min Lee. |
| 264 #1 - PRODUCTION, PUBLICATION, DISTRIBUTION, MANUFACTURE, AND COPYRIGHT NOTICE | |
| Place of production, publication, distribution, manufacture | Bristol [England] (Temple Circus, Temple Way, Bristol BS1 6HG, UK) : |
| Name of producer, publisher, distributor, manufacturer | IOP Publishing, |
| Date of production, publication, distribution, manufacture, or copyright notice | [2021] |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | 1 online resource (various pagings) : |
| Other physical details | illustrations (some color). |
| 336 ## - CONTENT TYPE | |
| Content type term | text |
| Source | rdacontent |
| 337 ## - MEDIA TYPE | |
| Media type term | electronic |
| Source | isbdmedia |
| 338 ## - CARRIER TYPE | |
| Carrier type term | online resource |
| Source | rdacarrier |
| 490 1# - SERIES STATEMENT | |
| Series statement | [IOP release $release] |
| 490 1# - SERIES STATEMENT | |
| Series statement | IOP series in advances in optics, photonics and optoelectronics |
| 490 1# - SERIES STATEMENT | |
| Series statement | IOP ebooks. [2021 collection] |
| 500 ## - GENERAL NOTE | |
| General note | "Version: 202109"--Title page verso. |
| 504 ## - BIBLIOGRAPHY, ETC. NOTE | |
| Bibliography, etc. note | Includes bibliographical references. |
| 505 0# - FORMATTED CONTENTS NOTE | |
| Formatted contents note | 1. Introduction to optical lithography -- 1.1. Principle of optical lithography -- 1.2. Evolution and history -- 1.3. Interrelation with IC manufacturing -- 1.4. The next-generation optical lithography : extreme ultraviolet (EUV) lithography |
| 505 8# - FORMATTED CONTENTS NOTE | |
| Formatted contents note | 2. Multilayer mirrors in extreme ultraviolet lithography -- 2.1. Composition and fabrication -- 2.2. ML based EUV photomasks -- 2.3. Multilayer mirror physics -- 2.4. Quarter-wavelength EUV mirror (Bragg mirror) -- 2.5. Photonic crystal (PHC) EUV mirror |
| 505 8# - FORMATTED CONTENTS NOTE | |
| Formatted contents note | 3. Efficient finite-difference time-domain (FDTD) approach -- 3.1. Numerical methods for EUV mirror design -- 3.2. FDTD expression for Maxwell's equation -- 3.3. Boundary conditions -- 3.4. Efficient FDTD method--the equivalent layer approach |
| 505 8# - FORMATTED CONTENTS NOTE | |
| Formatted contents note | 4. Simulation cases -- 4.1. 2D simulation : EUV mirror with surface roughness -- 4.2. 3D simulation : EUV mirror patterned with periodic contact holes -- 4.3. 3D simulation : porous EUV mirror |
| 505 8# - FORMATTED CONTENTS NOTE | |
| Formatted contents note | 5. Summaries and challenges -- 5.1. Summaries -- 5.2. Challenges. |
| 520 3# - SUMMARY, ETC. | |
| Summary, etc. | Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel's equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method. |
| 521 ## - TARGET AUDIENCE NOTE | |
| Target audience note | Optical engineers, upper level undergrad and grad level students, lens design, optomechanics, scientists, researchers. |
| 530 ## - ADDITIONAL PHYSICAL FORM AVAILABLE NOTE | |
| Additional physical form available note | Also available in print. |
| 538 ## - SYSTEM DETAILS NOTE | |
| System details note | Mode of access: World Wide Web. |
| 538 ## - SYSTEM DETAILS NOTE | |
| System details note | System requirements: Adobe Acrobat Reader, EPUB reader, or Kindle reader. |
| 545 ## - BIOGRAPHICAL OR HISTORICAL DATA | |
| Biographical or historical data | Dr Yen-Min Lee obtained his PhD from the National Taiwan University (Taipei, Taiwan) before joining ASML Holding as a mechatronics engineer in their motion design group in the USA. He went on to join the optical design group at Eindhoven and served as a senior physics engineer in the optical metrology group (Linkou, Taiwan). His research interests include computational lithography, large-scale electromagnetic problems, parallel computing, inverse algorithms, optical metrology, and medical imaging. |
| 588 0# - SOURCE OF DESCRIPTION NOTE | |
| Source of description note | Title from PDF title page (viewed on October 9, 2021). |
| 650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | Extreme ultraviolet lithography. |
| 9 (RLIN) | 70240 |
| 650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | Mirrors |
| General subdivision | Design and construction. |
| 9 (RLIN) | 70241 |
| 650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | Finite differences |
| General subdivision | Data processing. |
| 9 (RLIN) | 70242 |
| 650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | Time-domain analysis. |
| 9 (RLIN) | 7250 |
| 650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | Optical physics. |
| Source of heading or term | bicssc |
| 9 (RLIN) | 70243 |
| 650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | Optics and photonics. |
| Source of heading or term | bisacsh |
| 9 (RLIN) | 18815 |
| 710 2# - ADDED ENTRY--CORPORATE NAME | |
| Corporate name or jurisdiction name as entry element | Institute of Physics (Great Britain), |
| Relator term | publisher. |
| 9 (RLIN) | 11622 |
| 776 08 - ADDITIONAL PHYSICAL FORM ENTRY | |
| Relationship information | Print version: |
| International Standard Book Number | 9780750326506 |
| -- | 9780750326537 |
| 830 #0 - SERIES ADDED ENTRY--UNIFORM TITLE | |
| Uniform title | IOP (Series). |
| Name of part/section of a work | Release 21. |
| 9 (RLIN) | 70244 |
| 830 #0 - SERIES ADDED ENTRY--UNIFORM TITLE | |
| Uniform title | IOP series in advances in optics, photonics and optoelectronics. |
| 9 (RLIN) | 70245 |
| 830 #0 - SERIES ADDED ENTRY--UNIFORM TITLE | |
| Uniform title | IOP ebooks. |
| Name of part/section of a work | 2021 collection. |
| 9 (RLIN) | 70246 |
| 856 40 - ELECTRONIC LOCATION AND ACCESS | |
| Uniform Resource Identifier | <a href="https://iopscience.iop.org/book/978-0-7503-2652-0">https://iopscience.iop.org/book/978-0-7503-2652-0</a> |
| 942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
| Koha item type | eBooks |
No items available.