"Version: 202109"--Title page verso.

Includes bibliographical references.

1. Introduction to optical lithography -- 1.1. Principle of optical lithography -- 1.2. Evolution and history -- 1.3. Interrelation with IC manufacturing -- 1.4. The next-generation optical lithography : extreme ultraviolet (EUV) lithography

2. Multilayer mirrors in extreme ultraviolet lithography -- 2.1. Composition and fabrication -- 2.2. ML based EUV photomasks -- 2.3. Multilayer mirror physics -- 2.4. Quarter-wavelength EUV mirror (Bragg mirror) -- 2.5. Photonic crystal (PHC) EUV mirror

3. Efficient finite-difference time-domain (FDTD) approach -- 3.1. Numerical methods for EUV mirror design -- 3.2. FDTD expression for Maxwell's equation -- 3.3. Boundary conditions -- 3.4. Efficient FDTD method--the equivalent layer approach

4. Simulation cases -- 4.1. 2D simulation : EUV mirror with surface roughness -- 4.2. 3D simulation : EUV mirror patterned with periodic contact holes -- 4.3. 3D simulation : porous EUV mirror

5. Summaries and challenges -- 5.1. Summaries -- 5.2. Challenges.

Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel's equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method.

Optical engineers, upper level undergrad and grad level students, lens design, optomechanics, scientists, researchers.

Also available in print.

Mode of access: World Wide Web.

System requirements: Adobe Acrobat Reader, EPUB reader, or Kindle reader.

Dr Yen-Min Lee obtained his PhD from the National Taiwan University (Taipei, Taiwan) before joining ASML Holding as a mechatronics engineer in their motion design group in the USA. He went on to join the optical design group at Eindhoven and served as a senior physics engineer in the optical metrology group (Linkou, Taiwan). His research interests include computational lithography, large-scale electromagnetic problems, parallel computing, inverse algorithms, optical metrology, and medical imaging.

Title from PDF title page (viewed on October 9, 2021).