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Atomic layer processing : semiconductor dry etching technology / Thorsten Lill.

By: Lill, Thorsten [author.].
Material type: materialTypeLabelBookPublisher: Weinheim, Germany : Wiley-VCH, 2021Description: 1 online resource.Content type: text Media type: computer Carrier type: online resourceISBN: 9783527824199; 3527824197; 9783527824182; 3527824189.Subject(s): Semiconductors -- EtchingGenre/Form: Electronic books.Additional physical formats: No titleDDC classification: 621.3815/2 Online resources: Wiley Online Library
Contents:
Introduction -- Fundamentals -- Thermal Etching -- Thermal Isotropic ALE -- Radical Etching -- Directional ALE -- Reactive Ion Etching -- Ion Beam Etching -- Etching Species Generation -- Emerging Etching Technologies.
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Introduction -- Fundamentals -- Thermal Etching -- Thermal Isotropic ALE -- Radical Etching -- Directional ALE -- Reactive Ion Etching -- Ion Beam Etching -- Etching Species Generation -- Emerging Etching Technologies.

Includes bibliographical references and index.

Online resource; title from PDF title page (John Wiley, viewed May 4, 2021).

Wiley Frontlist Obook All English 2021

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